Bio-MEMS Technologies and Applications by Wanjun Wang, Steven A. Soper PDF

By Wanjun Wang, Steven A. Soper

ISBN-10: 0849335329

ISBN-13: 9780849335327

Microelectromechanical platforms (MEMS) are evolving into hugely built-in applied sciences for numerous program components. upload the organic size to the combo and a number of latest difficulties and concerns come up that require a extensive figuring out of elements from uncomplicated, fabrics, and scientific sciences as well as engineering. amassing the efforts of well known leaders in each one of those fields, BioMEMS: applied sciences and purposes provides the 1st wide-reaching survey of the layout and alertness of MEMS applied sciences to be used in organic and scientific components. This ebook considers either the original features of organic samples and the demanding situations of microscale engineering. Divided into 3 major sections, it first examines fabrication applied sciences utilizing non-silicon tactics, which use fabrics which are acceptable for medical/biological analyses. those comprise UV lithography, LIGA, nanoimprinting, injection molding, and hot-embossing. consciousness then shifts to microfluidic parts and sensing applied sciences for pattern instruction, supply, and research. the ultimate part outlines a variety of purposes and platforms on the cutting edge of BioMEMS expertise in quite a few components similar to genomics, drug supply, and proteomics. Laying a cross-disciplinary beginning for extra improvement, BioMEMS: applied sciences and functions offers engineers with an realizing of the organic demanding situations and organic scientists with an figuring out of the engineering demanding situations of this burgeoning expertise.

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21] R. Yang and W. Wang, Application of optical refractive index liquid and wavelength selection for ultra-high-aspect-ratio UV-lithography of thick SU-8 resist,” Sensor and Actuator B: Chemical, 110/2, 279–288, 2005. [22] Y. J. Chuang, T. G. Tseng, and W. K. Lin, Reduction of diffraction effect of UV exposure on SU-8 negative thick photoresist by air gap elimination, Microsystem Technologies, 8, 308–313, 2002. [23] E. Reznikova, V. Namov, and J. Mour, Deep photo-lithography characterization of SU-8 resist layers, Microsystem Technologies, 11, 4–5, 282–291, 2005.

2 Nickel Electroplating and Solutions ............................................ 3 Electroplating Quality and Influential Factors........................... 1 Internal Stress .................................................................... 1 Current Density .............................................. 2 Temperature..................................................... 3 pH Value .......................................................... 4 Agitation ..........................................................

Beryllium, carbon (amorphous or glassy graphite), and polyimide are suitable substrates with acceptable thicknesses ranging from 50 to 1000 µm, while a few micrometer-thin membrane masks from silicon, silicon-nitride, diamond, or titanium offer an alternative option. 4 (a) DEX 03 scanner inside the radiation hutch at the CAMD XRLM 4 beamline. (b) DEX 02 scanner inside the radiation hutch at the CAMD XRLM 1 beamline. using high-atomic-number material, typically gold, forming the absorber pattern.

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Bio-MEMS Technologies and Applications by Wanjun Wang, Steven A. Soper


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