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By H. Shih

ISBN-10: 9535104675

ISBN-13: 9789535104674

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The efforts and methodology developed through these studies have built up the foundation in the advanced materials characterization, development and application. A systematic study of chamber materials for plasma etching tools has been demonstrated. The materials studied include anodized aluminum, boron carbide coating, Y2O3 coating and sintered Y2O3 as well as the solid solution of aluminum oxide and yttrium oxide (YAG). In addition to the discussion of systematic study of anodized aluminum, an advanced anodized aluminum developed has shown no corrosion in seawater environment for 365 days.

56] Hong Shih and John Daugherty, “Chamber Materials for Current and Future Etchers”, Lam Technical Report, December 10, 2011. [57] Hong Shih, Shun Wu, and David Song, “Coordination of HCl Bubble Test and Electrochemical Impedance Spectroscopy of Lam Worldwide Anodizers”, Lam Technical Report, December 20, 2010. [58] Lin Xu and Hong Shih, “Secondary Phase Distribution of Al6061-T6 Alloys”, Lam Technical Report, September 7, 2011. [59] Hong Shih, “Electrochemical Impedance Spectroscopy Study of AI and Altefco DChamber Using Alcan Ravenswood 11” Thick Block”, Lam Technical Report, February 14, 2011.

Plasma resistance under both BCl3/Cl2 and SF6/HBr gases. A Systematic Study and Characterization of Advanced Corrosion Resistance Materials and Their Applications for Plasma Etching Processes in Semiconductor Silicon Wafer Fabrication 25 In order to study Y2O3 coating on anodized aluminum, the following electrochemical cell configuration is used to study the overall impedance and interface model of the coated samples or parts as shown in Fig. 27 [28, 78]. Fig. 27. 5wt% NaCl solution [78]. An interface model of Y2O3 coated anodize aluminum shows a three-time constant interface model indicating a Y2O3 coated layer, the porous layer of anodized aluminum, and the barrier layer of anodized aluminum as shown in Fig.

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Corrosion Resistance by H. Shih

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